The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2015

Filed:

Aug. 30, 2012
Applicants:

Hermann Luyken, Ludwigshafen, DE;

Sebastian Ahrens, Wiesloch, DE;

Gordon Brasche, Frankfurt, DE;

Jens Baldamus, Ludwigshafen, DE;

Robert Baumann, Mannheim, DE;

Randolf Hugo, Dirmstein, DE;

Stephanie Jaegli, Mannheim, DE;

Johann-peter Melder, Böhl-Iggelheim, DE;

Jörg Pastre, Bensheim, DE;

Boris Buschhaus, Mannheim, DE;

Inventors:

Hermann Luyken, Ludwigshafen, DE;

Sebastian Ahrens, Wiesloch, DE;

Gordon Brasche, Frankfurt, DE;

Jens Baldamus, Ludwigshafen, DE;

Robert Baumann, Mannheim, DE;

Randolf Hugo, Dirmstein, DE;

Stephanie Jaegli, Mannheim, DE;

Johann-Peter Melder, Böhl-Iggelheim, DE;

Jörg Pastre, Bensheim, DE;

Boris Buschhaus, Mannheim, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 241/04 (2006.01); C07C 253/30 (2006.01); C07C 209/48 (2006.01); C07D 295/00 (2006.01);
U.S. Cl.
CPC ...
C07C 253/30 (2013.01); C07C 209/48 (2013.01);
Abstract

A process for reacting formaldehyde cyanohydrin (FACH) with ethylenediamine (EDA) in a reactor with limited backmixing at a temperature in the range from 20 to 120° C., wherein the residence time in the reactor is 300 seconds or less.


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