The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Dec. 30, 2013
Cambridge Enterprise Limited, Cambridge, GB;
Christopher Robin Lowe, Cambridge, GB;
Colin Alexander Bennett Davidson, Cambridge, GB;
Jeffrey Blyth, Cambridge, GB;
Cambridge Enterprise Limited, Cambridge, GB;
Abstract
A method for the production of a holographic sensor which comprises a support medium supporting a reflection hologram wherein the support medium interacts with its physical or chemical environment to create an optical response which is a change in one or more optical properties of the hologram, the method comprising the steps of: a) introducing a colloidal dispersion of a recording material into the support medium; and b) ablating the colloidal particles of the recording material using a pulsed laser to form the holographic element in the support medium. The method of production can be used to introduce a reflection holographic grating into a hydrophobic support medium, in particular, polydimethylsiloxane (PDMS), which possesses an extraordinary ability to swell in the presence of both liquid and/or gaseous low molecular weight hydrocarbons and organic solvents and thus has many applications as a holographic sensor.