The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2015

Filed:

May. 16, 2013
Applicant:

The United States of America As Represented BY the Administrator of the National Aeronautics and Space Administration, Washington, DC (US);

Inventors:

Jacqueline W. Quinn, Titusville, FL (US);

Christian A. Clausen, Chuluota, FL (US);

Cherie L. Yestrebsky, Geneva, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 8/02 (2006.01); B01D 11/04 (2006.01); C02F 1/28 (2006.01); A62D 3/34 (2007.01); B01D 71/24 (2006.01); B01D 71/42 (2006.01); B09C 1/02 (2006.01); B09C 1/08 (2006.01); C02F 1/44 (2006.01); A62D 3/37 (2007.01); C02F 1/26 (2006.01); C02F 101/36 (2006.01); C02F 103/00 (2006.01); C02F 103/06 (2006.01);
U.S. Cl.
CPC ...
B01D 11/0415 (2013.01); A62D 3/37 (2013.01); B09C 2101/00 (2013.01); C02F 1/26 (2013.01); C02F 1/285 (2013.01); C02F 2101/363 (2013.01); C02F 2103/007 (2013.01); C02F 2103/06 (2013.01); A62D 3/34 (2013.01); B01D 71/24 (2013.01); B01D 71/42 (2013.01); B09C 1/025 (2013.01); B09C 1/08 (2013.01); C02F 1/445 (2013.01); Y10S 588/90 (2013.01); Y10S 588/901 (2013.01);
Abstract

A treatment system and a method for removal of at least one halogenated compound, such as PCBs, found in contaminated systems are provided. The treatment system includes a polymer blanket for receiving at least one non-polar solvent. The halogenated compound permeates into or through a wall of the polymer blanket where it is solubilized with at least one non-polar solvent received by said polymer blanket forming a halogenated solvent mixture. This treatment system and method provides for the in situ removal of halogenated compounds from the contaminated system. In one embodiment, the halogenated solvent mixture is subjected to subsequent processes which destroy and/or degrade the halogenated compound.


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