The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Dec. 16, 2008
Applicants:
Yang Yang LI, Hong Kong, CN;
Zhengtao Xu, Hong Kong, CN;
Chun Kwan Tsang, Hong Kong, CN;
Inventors:
Assignee:
City University of Hong Kong, Kowloon Tong, Kowloon, HK;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B31D 3/00 (2006.01); C23F 1/00 (2006.01); C25D 5/18 (2006.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
B82Y 20/00 (2013.01);
Abstract
A foraminous microstructure or film that has photonic or plasmonic properties is made by forming a structure or film composed of at least two constituent materials so that the compositional ratio of the constituent materials varies in a depth direction of the structure, and then removing one of the materials from the structure.