The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Jul. 26, 2012
Kwok Wei Shah, Singapore, SG;
Xiaodi Su, Sinagpore, SG;
Soo Jin Chua, Singapore, SG;
Hong Yee Low, Singapore, SG;
Kwok Wei Shah, Singapore, SG;
Xiaodi Su, Sinagpore, SG;
Soo Jin Chua, Singapore, SG;
Hong Yee Low, Singapore, SG;
Agency for Science, Technology and Research, Singapore, SG;
Abstract
The present invention relates to a method of forming polymer substrate with variable refractive index sensitivity, the method comprising the steps of: (a) contacting a metal-coated patterned mold with a polymer substrate at a temperature sufficient to deform said polymer substrate to thereby deposit a patterned mask of a metal film on the polymer substrate; and (b) etching away portions of said polymer substrate not covered by said patterned mask under conditions to form a region of variable refractive index sensitivity on said polymer substrate.