The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Sep. 07, 2012
Matthew Ryan, Appleton, WI (US);
Susanne Klaschka, Nuremberg, DE;
Barbara Elmer, Menasha, WI (US);
Voith Patent GmbH, Heidenheim, DE;
Abstract
A process for preparing a seam area for a paper machine clothing (PMC) base fabric includes the steps of: forming the PMC base fabric by flat-weaving, the PMC base fabric including warp yarns extending in machine direction and weft yarns extending in cross machine direction and interwoven with the warp yarns, the weft yarns including first weft yarns and a second weft yarn, the second weft yarn being a multifilament yarn, the warp yarns, the first weft yarns, and the multifilament yarn being woven together on a loom in an original weaving process, the multifilament yarn being positioned in an anticipated seam area; and folding over the PMC base fabric, after weaving the multifilament yarn with the warp yarns, to form a seam loop of the PMC base fabric such that the multifilament yarn is a first one of the weft yarns on a sheet side of the seam loop.