The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2015

Filed:

Mar. 14, 2013
Applicant:

Samsung Electro-mechanics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Sang Moon Lee, Suwon-si, KR;

Young Seuck Yoo, Suwon-si, KR;

Jong Yun Lee, Suwon-si, KR;

Young Do Kweon, Suwon-si, KR;

Sung Kwon Wi, Suwon-si, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/06 (2006.01); H01F 41/02 (2006.01); H01F 41/04 (2006.01);
U.S. Cl.
CPC ...
H01F 41/02 (2013.01); H01F 41/041 (2013.01);
Abstract

Disclosed herein is a method for manufacturing a high frequency inductor, the method including; forming a primary coil for manufacturing the high frequency inductor on a wafer; coating a primary PSV on the wafer on which the primary coil is formed; forming a secondary coil for manufacturing the high frequency inductor, after the coating of the primary PSV; coating a secondary PSV, after the forming of the secondary coil; forming a barrier layer on an electrode portion to be exposed of the high frequency inductor, after the coating of the secondary PSV; filling and curing an insulating resin on the wafer, after the forming of the barrier layer; and polishing the cured resin up to the barrier layer to expose the electrode.


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