The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Oct. 28, 2010
Ying Huang, Beijing, CN;
Ying Liu, Beijing, CN;
Wei Zhao, Beijing, CN;
Xin Zhou, Beijing, CN;
Jun Zhu, Beijing, CN;
Ying Huang, Beijing, CN;
Ying Liu, Beijing, CN;
Wei Zhao, Beijing, CN;
Xin Zhou, Beijing, CN;
Jun Zhu, Beijing, CN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and a system for identifying and resolving conflicts between design results from a parallel software design. The method includes: receiving a design diagram, wherein the design diagram includes a plurality of nodes and arrows connecting different nodes, with each node indicating a design artifact, and an arrow directed from one node to another node indicating that a design artifact corresponds to the one node depends on a design artifact corresponding to the other node; determining a level of a design artifact in the design diagram, identifying different design artifacts at a given level of the design diagram that depend on a common design artifact, and marking them as isomorphic design artifacts; and outputting a design diagram with the isomorphic design artifacts marked. A conflict between relevant designs are automatically identified in a bottom-up approach according to a software design hierarchy to facilitate conflict resolution.