The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Jan. 31, 2002
Li-shiuan Peh, Princeton, NJ (US);
Michael Justin O'sullivan, Auckland, NZ;
John Wilkes, Palo Alto, CA (US);
Julie Ann Ward, Menlo Park, CA (US);
Li-Shiuan Peh, Princeton, NJ (US);
Michael Justin O'Sullivan, Auckland, NZ;
John Wilkes, Palo Alto, CA (US);
Julie Ann Ward, Menlo Park, CA (US);
Hewlett-Packasrd Development Comany, L.P., Houston, TX (US);
Abstract
A technique for generating interconnect fabric requirements. The technique programmatically generates an interconnect design problem based on criteria specified by a user. In one aspect, a computer implemented method is provided for generating an interconnect fabric design problem. The problem includes requirements for a plurality of flows among a set of network nodes. A source node and a terminal node are selected, from among the set of network nodes, for a flow to be added to the requirements. A maximum capacity available at the selected source node and the selected terminal node is determined. The flow is generated having a capacity less than or equal to the lower of the maximum capacity of the source node and the terminal node. Depending upon the input criteria, the invention may generate problems with greater flexibility than prior techniques.