The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Nov. 11, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Ryosuke Iguchi, Kawasaki, JP;
Nobutaka Miyake, Yokohama, JP;
Akitoshi Yamada, Yokohama, JP;
Mitsuhiro Ono, Tokyo, JP;
Fumitaka Goto, Tokyo, JP;
Hidetsugu Kagawa, Kawasaki, JP;
Tomokazu Ishikawa, Yokohama, JP;
Junichi Nakagawa, Tokyo, JP;
Senichi Saito, Funabashi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
One dither mask having a highest spacial frequency is selected from a plurality of dither masks. Next, a granularity is obtained with reference to a table based on the selected dither mask and an ejection amount level per area. Moreover, a difference in granularity between adjacent areas is calculated with respect to all of the areas. A maximum value is obtained out of the obtained differences in granularity, and then, the maximum difference in granularity is compared with a determination threshold. When the maximum difference in granularity is the threshold or greater, it is determined whether or not a dither mask having a spacial frequency lower than that of the selected dither mask is stored in a memory. When there are dither masks having lower spacial frequencies, a dither mask having a spacial frequency lower by one level than that of the selected dither mask is selected.