The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Apr. 18, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Masayuki Hirano, Matsudo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Density unevenness is suppressed even in an image that is formed by a multiple exposures method in which the same region on a photoreceptor is exposed multiple times with different laser light sources (light emitting elements), by adjusting the amounts of light of the respective lasers based on a density difference among test images. An image is formed for each group of light emitting elements grouped together for multiple exposures by dividing, in the main scanning direction, the region of a test image formed on a recording medium. The images formed for the respective multiple-exposure light emitting element groups are compared to one another in density, to thereby adjust the amounts of light of the respective laser light sources (light emitting elements) and reduce fluctuations in image density.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile