The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2015

Filed:

May. 19, 2011
Applicants:

Sadaaki Katou, Ibaraki, JP;

Junichi Kamei, Chiba, JP;

Inventors:

Sadaaki Katou, Ibaraki, JP;

Junichi Kamei, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); B32B 1/06 (2006.01); C08F 2/48 (2006.01); G03F 7/027 (2006.01); G03F 7/028 (2006.01); G03F 7/031 (2006.01); G03F 7/20 (2006.01); H03H 9/10 (2006.01); H03H 9/64 (2006.01); C08F 222/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/031 (2013.01); B32B 1/06 (2013.01); C08F 2/48 (2013.01); C08F 222/1006 (2013.01); G03F 7/027 (2013.01); G03F 7/028 (2013.01); G03F 7/20 (2013.01); H03H 9/1071 (2013.01); H03H 9/64 (2013.01); Y10T 428/1352 (2013.01);
Abstract

Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition. Used as the component (A) are acrylate compounds or methacrylate compounds, to be specific, an acrylate compound or a methacrylate compound having an amide group and an acrylate compound or a methacrylate compound containing a urethane bond.


Find Patent Forward Citations

Loading…