The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
May. 14, 2012
Applicants:
Bong-yeon Kim, Seoul, KR;
Min Kang, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Jin Ho Ju, Seoul, KR;
Inventors:
Assignee:
Samsung Display Co., Ltd., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01);
Abstract
Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.
Kim, Bong-Yeon. (2015). Mask for exposure and method of fabricating substrate using said mask (U.S. Patent No. 9005850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9005850
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