The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2015

Filed:

Jun. 02, 2011
Applicants:

Jeffrey A. Rock, Fairport, NY (US);

Yeh-hung Lai, Webster, NY (US);

Keith E. Newman, Athens, PA (US);

Gerald W. Fly, Geneseo, NY (US);

Ping Liu, Irvine, CA (US);

Alan J. Jacobsen, Woodland Hills, CA (US);

William B. Carter, Calabasas, CA (US);

Peter D. Brewer, Westlake Village, CA (US);

Inventors:

Jeffrey A. Rock, Fairport, NY (US);

Yeh-Hung Lai, Webster, NY (US);

Keith E. Newman, Athens, PA (US);

Gerald W. Fly, Geneseo, NY (US);

Ping Liu, Irvine, CA (US);

Alan J. Jacobsen, Woodland Hills, CA (US);

William B. Carter, Calabasas, CA (US);

Peter D. Brewer, Westlake Village, CA (US);

Assignees:

GM Global Technology Operations LLC, Detroit, MI (US);

HRL Laboratories, LLC, Malibu, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 8/00 (2006.01); H01M 2/08 (2006.01); H01M 2/14 (2006.01); B05D 5/12 (2006.01); H01M 8/02 (2006.01); H01M 8/10 (2006.01);
U.S. Cl.
CPC ...
H01M 8/0232 (2013.01); H01M 8/0236 (2013.01); H01M 8/0239 (2013.01); H01M 8/0245 (2013.01); H01M 8/0258 (2013.01); H01M 8/0267 (2013.01); H01M 2008/1095 (2013.01); Y02E 60/50 (2013.01);
Abstract

A method for fabricating a fuel cell component includes the steps of providing a mask having a plurality of radiation transparent apertures, a radiation-sensitive material having a sensitivity to the plurality of radiation beams, and a flow field layer. The radiation-sensitive material is disposed on the flow field layer. The radiation-sensitive material is then exposed to the plurality of radiation beams through the radiation transparent apertures in the mask to form a diffusion medium layer with a micro-truss structure.


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