The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Jul. 16, 2009
Eric Tixhon, Crisnee, BE;
Joseph Leclercq, Evere, BE;
Eric Michel, Uckange, FR;
AGC Glass Europe, Brussels, BE;
Abstract
A process for the simultaneous deposition of films onto both sides of a substrate (), which comprises in particular introducing a substrate () into a reaction chamber () or making said substrate run therethrough, in which chamber at least two electrodes () are placed. At least one dielectric barrier () is placed between these at least two electrodes (). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma () on each side of the substrate between the at least two electrodes ().