The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2015

Filed:

Jun. 12, 2013
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Shinan Wang, Kashiwa, JP;

Toru Nakakubo, Kawasaki, JP;

Hirotaka Sekiguchi, Fujisawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 17/00 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/164 (2013.01); B41J 2/1609 (2013.01); B41J 2/1623 (2013.01); B41J 2/1631 (2013.01); B41J 2/1632 (2013.01); B41J 2/1634 (2013.01); B41J 2/1642 (2013.01); B41J 2/1646 (2013.01);
Abstract

A process for producing a liquid ejection head having a piezoelectric body provided with an ejection orifice for ejecting liquid and a pressure chamber communicating therewith for retaining the liquid, wherein an electrode is formed on an inner wall surface of the pressure chamber to deform the pressure chamber by piezoelectric action caused by applying voltage to the electrode to eject the liquid, comprising providing the piezoelectric body in which a surface thereof having the ejection orifice has an arithmetic mean roughness of 0.1-1 μm, forming a dry film resist pattern on the surface of the piezoelectric body so as to expose the ejection orifice and a linear region connected thereto, and forming a metal thin film pattern being connected to the electrode on the inner wall surface and continuously extending from the inner wall surface to the linear region by using the dry film resist pattern as a mask.


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