The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Sep. 23, 2011
Applicants:

Min OH Choi, Asan-si, KR;

Hee Wook DO, Cheonan-si, KR;

Seungbeom Park, Seoul, KR;

Sang-gu Lee, Seoul, KR;

Seunghan JO, Seoul, KR;

Inventors:

Min Oh Choi, Asan-si, KR;

Hee Wook Do, Cheonan-si, KR;

Seungbeom Park, Seoul, KR;

Sang-Gu Lee, Seoul, KR;

Seunghan Jo, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/1343 (2006.01); G02F 1/1347 (2006.01);
U.S. Cl.
CPC ...
G02F 1/134309 (2013.01); G02F 1/13471 (2013.01);
Abstract

Provided is a shutter panel including a first substrate on which a plurality of electric field forming electrodes are parallel to each other, a second substrate opposed to the first substrate, and a liquid crystal layer disposed on the first and second substrates. Each of the electric field forming electrodes has both side surfaces facing the adjacent electric field forming electrodes, and both side surfaces are provided with protrusion parts protruding toward the adjacent electric field forming electrodes.


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