The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Mar. 15, 2011
Applicants:

Justin Phelps Black, San Jose, CA (US);

Srinivasan Kodaganallur Ganapathi, San Jose, CA (US);

Philip Jason Stephanou, San Jose, CA (US);

Kurt Edward Peterson, San Jose, CA (US);

Cenk Acar, Irvine, CA (US);

Ravindra Vaman Shenoy, San Jose, CA (US);

Nicholas Ian Buchan, San Jose, CA (US);

Inventors:

Justin Phelps Black, San Jose, CA (US);

Srinivasan Kodaganallur Ganapathi, San Jose, CA (US);

Philip Jason Stephanou, San Jose, CA (US);

Kurt Edward Peterson, San Jose, CA (US);

Cenk Acar, Irvine, CA (US);

Ravindra Vaman Shenoy, San Jose, CA (US);

Nicholas Ian Buchan, San Jose, CA (US);

Assignee:

Qualcomm MEMS Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 41/00 (2013.01); H01L 41/113 (2006.01); H01L 41/08 (2006.01); G01C 19/5769 (2012.01); B81B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 41/1132 (2013.01); H01L 41/08 (2013.01); G01C 19/5769 (2013.01); B81B 3/0078 (2013.01); B81B 2201/0242 (2013.01);
Abstract

This disclosure provides systems, apparatus, and devices and methods of fabrication for electromechanical devices. In one implementation, an apparatus includes a metal proof mass and a piezoelectric component as part of a MEMS device. Such apparatus can be particularly useful for MEMS gyroscope devices. For instance, the metal proof mass, which may have a density several times larger than that of silicon, is capable of reducing the quadrature and bias error in a MEMS gyroscope device, and capable of increasing the sensitivity of the MEMS gyroscope device.


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