The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Aug. 27, 2010
Applicants:
Hajime Kuwabara, Tokyo, JP;
Kazuhiko Horioka, Tokyo, JP;
Inventors:
Hajime Kuwabara, Tokyo, JP;
Kazuhiko Horioka, Tokyo, JP;
Assignees:
IHI Corporation, Tokyo, JP;
Tokyo Institute of Technology, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 1/70 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); H05G 2/008 (2013.01);
Abstract
An LPP EUV light source includes a vacuum chamberthat is maintained in a vacuum environment; a gas jet devicethat forms a hypersonic steady gas jetof the target substance inside the vacuum chamber so as to be collected; and a laser devicethat collects and radiates a laser beamto the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting pointof the laser beam and EUV lightis emitted therefrom.