The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Jan. 26, 2012
Yong Ho Lee, Incheon, KR;
Manseong Jeon, Daejeon, KR;
Heon-yong Kwon, Daejeon, KR;
Min-seok Cho, Daejeon, KR;
Seon Kyoung Kim, Daejeon, KR;
Dae-sik Hong, Gunpo-si, KR;
SE Hui Sohn, Daejeon, KR;
Ki-soo Lee, Daejeon, KR;
Kyoung-chan Lim, Daejeon, KR;
Yong Ho Lee, Incheon, KR;
Manseong Jeon, Daejeon, KR;
Heon-Yong Kwon, Daejeon, KR;
Min-Seok Cho, Daejeon, KR;
Seon Kyoung Kim, Daejeon, KR;
Dae-Sik Hong, Gunpo-si, KR;
Se Hui Sohn, Daejeon, KR;
Ki-Soo Lee, Daejeon, KR;
Kyoung-Chan Lim, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present description relates to olefin block copolymers having excellent elasticity and processability in conjunction with enhanced heat resistance, and to a preparation method thereof. The olefin block copolymers comprise a plurality of blocks or segments that comprise ethylene or propylene repeating units and α-olefin repeating units at different mole fractions from one another, wherein the block copolymer shows peaks at the 2θ of 21.5±0.5° and 23.7±0.5° in a wide-angle x-ray diffraction (WAXD) pattern, and the peak ratio defined by (the peak area at 21.5±0.5°)/(the peak area at 23.7±0.5°) is no more than 3.0.