The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Dec. 09, 2008
Applicants:
Francisco Leon, Palo Alto, CA (US);
Francesco Lemmi, Sunnyvale, CA (US);
Jeffrey Miller, Los Altos Hills, CA (US);
David Dutton, San Jose, CA (US);
David P. Stumbo, Belmont, CA (US);
Inventors:
Francisco Leon, Palo Alto, CA (US);
Francesco Lemmi, Sunnyvale, CA (US);
Jeffrey Miller, Los Altos Hills, CA (US);
David Dutton, San Jose, CA (US);
David P. Stumbo, Belmont, CA (US);
Assignee:
OneD Material LLC, Palo Alto, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 29/06 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0665 (2013.01); B81C 1/00142 (2013.01); B82Y 10/00 (2013.01); H01L 29/0673 (2013.01); H01L 29/66772 (2013.01); H01L 29/78603 (2013.01); H01L 29/78696 (2013.01);
Abstract
The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.