The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Jun. 26, 2013
Applicant:

Semiconductor Manufacturing International Corporation (Shanghai), Shanghai, CN;

Inventors:

Steven Zhang, Shanghai, CN;

Liya Fu, Shainghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 29/417 (2006.01); H01L 21/768 (2006.01); H01L 21/8238 (2006.01); H01L 29/78 (2006.01); H01L 23/485 (2006.01);
U.S. Cl.
CPC ...
H01L 29/41725 (2013.01); H01L 21/76879 (2013.01); H01L 21/823814 (2013.01); H01L 29/7845 (2013.01); H01L 23/485 (2013.01); H01L 21/76808 (2013.01); H01L 21/76816 (2013.01); H01L 21/76877 (2013.01); H01L 21/823807 (2013.01); H01L 21/823871 (2013.01); H01L 29/78 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device and method of fabricating the device are provided, the method including providing an insulating layer, wherein the insulating layer covers an active region and a gate of at least one semiconductor device; forming connection holes to the active region in the insulating layer to expose at least part of the active region, wherein the connection holes include a first portion of a first width and a second portion of a second width, the first portion of the connection holes being adjacent to the active region, and the first width being less than the second width; filling the connection holes with a metal material to form the contacts to the active region. As such, contacts formed for the active region also include a first portion of a first width and a second portion of a second width.


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