The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Mar. 27, 2012
Satoshi Hiyama, Chiyoda-ku, JP;
Kaori Kuribayashi, Bunkyo-ku, JP;
Hiroaki Onoe, Bunkyo-ku, JP;
Shoji Takeuchi, Bunkyo-ku, JP;
Satoshi Hiyama, Chiyoda-ku, JP;
Kaori Kuribayashi, Bunkyo-ku, JP;
Hiroaki Onoe, Bunkyo-ku, JP;
Shoji Takeuchi, Bunkyo-ku, JP;
NTT DOCOMO, INC., Tokyo, JP;
The University of Tokyo, Tokyo, JP;
Abstract
A method for fabricating a microarray of plural soft materials includes: vapor-depositing a first layer poly(para-xylylene) resin on a substrate, forming a first micro pattern in the poly(para-xylylene) resin; obtaining a substrate including a first microarray formed by pouring a first soft material solution, freeze-drying the first soft material to obtain a micro-arrayed substrate of the freeze-dried first soft material; vapor-depositing a second layer poly(para-xylylene) resin on the micro-arrayed substrate of the freeze-dried first soft material, forming a second micro pattern placed differently from the first micro pattern by penetrating the poly(para-xylylene) resin of the first and second layers, forming a second microarray on the substrate by pouring a second soft material solution; and forming a microarray of the first and second soft materials on the substrate by peeling off the poly(para-xylylene) resin of the first and second layers.