The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Jan. 04, 2013
Applicant:
President and Fellows of Harvard College, Cambridge, MA (US);
Inventors:
Marko Loncar, Belmont, MA (US);
Mikhail D. Lukin, Cambridge, MA (US);
Michael J. Burek, Somerville, MA (US);
Nathalie de Leon, Somerville, MA (US);
Brendan Shields, Somerville, MA (US);
Assignee:
President and Fellows of Harvard College, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 (2006.01); H01L 21/683 (2006.01); H01L 33/00 (2010.01); H01L 21/3065 (2006.01); G02B 6/136 (2006.01); H01J 37/32 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01); H01L 29/04 (2006.01); H01L 29/06 (2006.01); G02B 6/122 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); G02B 6/136 (2013.01); G02B 6/1225 (2013.01); H01J 37/32577 (2013.01); H01J 37/32651 (2013.01); H01J 37/32715 (2013.01); H01J 2237/0266 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3341 (2013.01); H01L 21/027 (2013.01); H01L 21/308 (2013.01); H01L 29/04 (2013.01); H01L 29/0665 (2013.01);
Abstract
An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.