The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Sep. 30, 2011
Enrico Magni, Pleasanton, CA (US);
Suresh Gupta, Fremont, CA (US);
Mark Gahagan, San Francisco, CA (US);
Eric Lenz, Pleasanton, CA (US);
Mike Ravkin, Los Altos, CA (US);
Enrico Magni, Pleasanton, CA (US);
Suresh Gupta, Fremont, CA (US);
Mark Gahagan, San Francisco, CA (US);
Eric Lenz, Pleasanton, CA (US);
Mike Ravkin, Los Altos, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.