The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Oct. 23, 2013
Applicant:

Reno Technologies, Inc., Wilmington, DE (US);

Inventors:

David J. Ferran, Del Mar, CA (US);

Robert J. Ferran, San Diego, CA (US);

Assignee:

Reno Technologies, Inc., Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 27/00 (2006.01);
U.S. Cl.
CPC ...
G01L 27/007 (2013.01);
Abstract

A system and a method detect contamination of a diaphragm in a capacitance diaphragm gauge wherein a contaminated diaphragm deflects less in the presence of pressure than an uncontaminated diaphragm. The system and method measure a base pressure. A DC voltage is applied between the diaphragm and a fixed electrode to cause the diaphragm to deflect to simulate an effective pressure. The system and method measure a combined pressure caused by the base pressure and the effective pressure. The system and method subtract the base pressure to determine the effective pressure caused by the static diaphragm deflection. If the measured effective pressure is less than an acceptable effective pressure, the system and method determine that the diaphragm is contaminated.


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