The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Nov. 23, 2012
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Heinz Fabian, Grossostheim, DE;
Juergen Roeper, Roitzsch, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
A known method for producing synthetic quartz glass comprises the method steps of: forming a stream of a SiOfeedstock material which contains octamethylcyclotetrasiloxane (D4) as the main component which has a reference molecular mass assigned to it, feeding the stream to a reaction zone in which the feedstock material is converted under formation of amorphous SiOparticles by pyrolysis or hydrolysis into SiO, depositing the amorphous SiOparticles on a deposition surface while forming a porous SiOsoot body, and vitrifying the SiOsoot body while forming the synthetic quartz glass. Starting therefrom, to enable the production of large-volume cylindrical soot bodies with outer diameters of more than 300 mm of improved material homogeneity, it is suggested according to the invention that the feedstock material contains additional components in the form of further polyalkylsiloxanes, wherein light polyalkylsiloxanes with a relative molecular mass of less than the reference molecular mass are contained with a weight fraction of at least 50 ppm, and heavy polyalkylsiloxanes with a relative molecular mass of more than the reference molecular mass are contained with a weight fraction of at least 30 ppm.