The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2015

Filed:

Oct. 29, 2008
Applicant:

Becker François, Lyons, FR;

Inventor:

Becker François, Lyons, FR;

Assignee:

Signoptic Technologies, Le Bourget du Lac, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/25 (2006.01); G01B 11/30 (2006.01); G01N 21/55 (2014.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2509 (2013.01); G01B 11/306 (2013.01); G01N 21/55 (2013.01); G01N 21/95 (2013.01);
Abstract

A device for observation, by reflection, of the structural details of an object () that exhibits a behavior that is at least partially specular, located in an exposure area, which includes: at least one radiation source with an emission surface () possessing at least two distinct zones () emitting streams of radiation, where at least one of the characteristics differs from one zone to the next; an optical projection system that is located in line with the radiation source in relation to the exposure zone, in the path of the radiation; an optical exposure system () designed to optically link the entry aperture () of the optical projection system and the emission surface (); a projection surface () that is linked optically with the object in the exposure zone, and whose received radiation depends on the deflection on the object ().


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