The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Mar. 13, 2013
Honeywell International Inc., Morristown, NJ (US);
Brett M. Clark, Spokane Valley, WA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
A method for assessing an alpha particle emission potential of a metallic material. A metallic material is initially subjected to a secular equilibrium disruption process, such as melting and/or refining, to disrupt the secular equilibrium of the radioactive decay of one or more target parent isotopes in the material. A sample of the material is treated to diffuse target decay isotopes within the sample such that the measured alpha particle emission directly corresponds to the concentration or number of target decay isotope atoms within the entirety of the sample, enabling the concentration of target decay isotopes in the sample to be determined. The concentration of target parent isotopes in the material may then be determined from the concentration of target decay isotopes and time elapsed from the secular equilibrium disruption process, and may be used to determine a maximum alpha particle emission that the metallic material will exhibit.