The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Feb. 11, 2013
Applicant:
Pixelligent Technologies, Llc, Baltimore, MD (US);
Inventors:
Gregory D. Cooper, Fulton, MD (US);
Brian L. Wehrenberg, Baltimore, MD (US);
Assignee:
Pixelligent Technologies, LLC, Baltimore, MD (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); H01L 29/06 (2006.01); G03F 7/00 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/20 (2013.01); H01L 29/06 (2013.01); G03F 7/0002 (2013.01); G03F 7/039 (2013.01); H01L 21/0271 (2013.01); B81C 1/00031 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); B81C 2201/0149 (2013.01);
Abstract
An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not self-assemble under at least some annealing conditions. The exposed block copolymer photoresist is processed to cleave at least some block copolymer bonds in the exposed selected regions. The exposed pinning layer is processed to create a chemical epitaxial pattern to direct the local self assembly of the block copolymer.