The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2015

Filed:

Nov. 19, 2008
Applicants:

Shuaigang Xiao, Cranberry Township, PA (US);

Xiaomin Yang, Sewickley, PA (US);

Inventors:

Shuaigang Xiao, Cranberry Township, PA (US);

Xiaomin Yang, Sewickley, PA (US);

Assignee:

Seagate Technology LLC, Scotts Valley, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); G11B 5/82 (2006.01); B05D 1/32 (2006.01); B05D 3/06 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); G11B 5/74 (2006.01); G11B 5/855 (2006.01);
U.S. Cl.
CPC ...
G11B 5/82 (2013.01); B05D 5/00 (2013.01); B05D 1/322 (2013.01); B05D 3/06 (2013.01); B81C 1/00031 (2013.01); B82Y 10/00 (2013.01); G11B 5/743 (2013.01); G11B 5/746 (2013.01); G11B 5/855 (2013.01); B81C 2201/0149 (2013.01);
Abstract

A method includes: providing a substrate having a plurality of chemically contrasted alignment features, and depositing a self-assembled material on at least a portion of the substrate, wherein the position and/or orientation of substantially spherical or cylindrical domains of the self-assembled material is directed by the alignment features, to form a nanostructure pattern, and wherein the period of the alignment features is between about 2 times and about 10 times the period of the spherical or cylindrical domains. An apparatus fabricated according to the method is also provided.


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