The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Dec. 12, 2007
Applicants:
Erik Maria Kelder, Nootdorp, NL;
Jan Rudolf Van Ommen, Zwijndrecht, NL;
John Nijenhuis, Asperen, NL;
Inventors:
Erik Maria Kelder, Nootdorp, NL;
Jan Rudolf Van Ommen, Zwijndrecht, NL;
John Nijenhuis, Asperen, NL;
Assignee:
Technische Universiteit Delft, Delft, NL;
Primary Examiner:
Int. Cl.
CPC ...
B05D 7/00 (2006.01); H01M 4/505 (2010.01); B01J 2/16 (2006.01); C23C 16/44 (2006.01); C23C 16/442 (2006.01); C23C 16/455 (2006.01); H01M 4/36 (2006.01);
U.S. Cl.
CPC ...
H01M 4/505 (2013.01); B01J 2/16 (2013.01); C23C 16/4417 (2013.01); C23C 16/442 (2013.01); C23C 16/45525 (2013.01); H01M 4/366 (2013.01); Y02E 60/122 (2013.01);
Abstract
A method for covering particles having a diameter of maximally 60 μm by means of atomic layer deposition, whereby said method comprises the step of fluidizing said particles in a fluidized bed reactor using a first reactant gas comprising a first reactant for substantially completely covering said particles with a monolayer of said first reactant.