The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
May. 30, 2012
Nobuo Yamaguchi, Tama, JP;
Kazuaki Matsuo, Inagi, JP;
Nobuo Yamaguchi, Tama, JP;
Kazuaki Matsuo, Inagi, JP;
Canon Anelva Corporation, Kawasaki-Shi, Kanagawa-ken, JP;
Abstract
This invention provides a sputtering method which can generate an electric discharge under practical conditions and maintain the pressure in a plasma space uniform, and a sputtering apparatus used for the same. The sputtering method includes a first gas introduction step (step S) of introducing a process gas from a first gas introduction port formed in a sputtering space defined by a deposition shield plate, a substrate holder, and the target which are disposed in a process chamber, a voltage application step (step S) of applying a voltage to the target after the first gas introduction step, and a second gas introduction step (step S) of introducing a process gas from a second gas introduction port formed outside the sputtering space.