The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2015

Filed:

Feb. 13, 2010
Applicants:

Carl A. Sorensen, Morgan Hill, CA (US);

Jozef Kudela, Sunnyvale, CA (US);

Robin L. Tiner, Santa Cruz, CA (US);

Suhail Anwar, San Jose, CA (US);

John M. White, Hayward, CA (US);

Inventors:

Carl A. Sorensen, Morgan Hill, CA (US);

Jozef Kudela, Sunnyvale, CA (US);

Robin L. Tiner, Santa Cruz, CA (US);

Suhail Anwar, San Jose, CA (US);

John M. White, Hayward, CA (US);

Assignee:

Applied Material, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/32091 (2013.01);
Abstract

For coupling RF power from an RF input of a plasma chamber to the interior of a plasma chamber, an RF bus conductor is connected between the RF input and a plasma chamber electrode. In one embodiment, an RF return bus conductor is connected to an electrically grounded wall of the chamber, and the RF bus conductor and the RF return bus conductor have respective surfaces that are parallel and face each other. In another embodiment, the RF bus conductor has a transverse cross section having a longest dimension oriented perpendicular to the surface of the plasma chamber electrode that is closest to the RF bus conductor.


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