The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2015

Filed:

Jun. 14, 2013
Applicant:

Ostendo Technologies, Inc., Carlsbad, CA (US);

Inventors:

Oleg Kovalenkov, Gaithersburg, MD (US);

Vitali Soukhoveev, Gaithersburg, MD (US);

Alexander Syrkin, Montgomery Villiage, MD (US);

Vladimir Sizov, Gaithersburg, MS (US);

Assignee:

Ostendo Technologies, Inc., Carlsbad, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/448 (2006.01); C23C 16/455 (2006.01); C23C 16/34 (2006.01); C30B 25/14 (2006.01); C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
C30B 35/00 (2013.01); C30B 25/14 (2013.01);
Abstract

The geometry of transition from cylindrical to rectangular shape through the conical part in hydride vapor phase epitaxial (HVPE) systems for deposition of III-nitride films is disclosed. It is used to ensure the laminar gas flow inside the growth zone of the system. For the velocity of flow within the atmospheric pressure reactor to be sufficient, the precursors are injected through the narrow diameter tubing injectors. The quartz reactor geometry is introduced to control the transition from jet to laminar flow.


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