The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2015

Filed:

Dec. 06, 2012
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Shin Ishimatsu, Yokohama, JP;

Kenji Fujii, Yokohama, JP;

Toshiaki Kurosu, Kawasaki, JP;

Takanobu Manabe, Kawasaki, JP;

Chiaki Muraoka, Kawaguchi, JP;

Sayaka Takahashi, Kawasaki, JP;

Yukuo Yamaguchi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21D 53/00 (2006.01); B41J 2/16 (2006.01); B41J 2/14 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1621 (2013.01); B41J 2/1603 (2013.01); B41J 2/162 (2013.01); B41J 2/1631 (2013.01); B41J 2/1632 (2013.01); B41J 2/1635 (2013.01); B41J 2002/14475 (2013.01); B41J 2202/11 (2013.01);
Abstract

This invention is a manufacturing method of a liquid discharge head that includes a substrate having a plurality of discharge energy generating elements that generate energy that is utilized for discharging a liquid, and a discharge port forming member that constitutes a discharge port group including a plurality of discharge ports that discharge the liquid and flow paths that communicate with the discharge port group. The manufacturing method includes (1) disposing a photosensitive resin as material of the discharge port forming member on or above the substrate, and (2) forming an exposure pattern of the discharge port group using ultraviolet light in the photosensitive resin. In the aforementioned (2), the discharge port group is divided in a longitudinal direction and exposed, and the exposures are respectively performed so that regions in which there is a high degree of telecentricity face each other.


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