The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Oct. 21, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Sebastian Carbajales, Toronto, CA;

Tak Seng Chau, Markham, CA;

Vladimir Klicnik, Oshawa, CA;

Raymond L. Kong, Markham, CA;

Lok T. Loi, Toronto, CA;

Alina Y. Rotarescu, Newmarket, CA;

Xiaobin Zhang, Richmond Hill, CA;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01); H04L 29/08 (2006.01);
U.S. Cl.
CPC ...
H04L 67/24 (2013.01); G06F 17/30581 (2013.01);
Abstract

A method of synchronizing artifacts of a first domain with artifacts of a second domain is provided. The method includes: loading a first set of transformed artifacts and a first artifact map from a first domain into a second domain; generating an association model based on an evaluation of the first artifact map and a second artifact map; comparing a first transformed artifact of the first set of transformed artifacts with a second artifact of a second set of artifacts corresponding to the second artifact map based on the association model; determining differences based on the comparing; and selectively updating the second artifact map based on the differences.


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