The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Dec. 23, 2013
Hgst Netherlands B.v., Amsterdam, NL;
Elizabeth A. Brinkman, Santa Clara, CA (US);
Ning Shi, San Jose, CA (US);
Brian R. York, San Jose, CA (US);
Sue S. Zhang, Saratoga, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A method for manufacturing a magnetic write head that has improved write poled uniformity and bevel angle control. The method uses a damascene process to form the write pole, wherein a trench is formed in a RIEable fill layer, and an adhesion layer is located only in areas outside of the trench. A seed layer is deposited into the trench, followed by a non-magnetic gap layer followed by electroplating of a magnetic material. A chemical mechanical polishing process is then performed, thereby forming a magnetic write pole within the trench. The adhesion layer located outside of the trench prevents de-lamination during the chemical mechanical polishing. However, not having any adhesion layer in the trench prevent oxidation related waviness or other deformation of the sides of the write pole.