The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Mar. 23, 2011
Jeffrey L. Guttman, Los Gatos, CA (US);
John M. Fleischer, San Jose, CA (US);
Mark E. Minshall, San Jose, CA (US);
Jeffrey L. Guttman, Los Gatos, CA (US);
John M. Fleischer, San Jose, CA (US);
Mark E. Minshall, San Jose, CA (US);
Ophir-Spiricon, LLC, Logan, UT (US);
Abstract
New systems for characterizing laser beams, using measurements performed on light which has been Rayleigh scattered from the beam. Different implementations are used for beam profiling, using images of the Rayleigh scattered light, and for laser beam power measurement, using the integrated Rayleigh scattered light. Both of these implementations can be applied to laser beams having high powers, since the measurements do not require insertion of any element into the beam itself, but rather depend on light scattered laterally from the passing beam. The measurements can thus be termed 'non contact' measurements, in contrast to prior art methods which require an element inserted into the beam. The systems use Rayleigh scattering from the laser beam passing through ambient air, such that no special scattering chambers or liquids are required for the measurements. Special cancellation algorithms or filters are used to discriminate from light arising from scattering from dust particles.