The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Sep. 16, 2013
Applicant:

Sandia Corporation, Albuquerque, NM (US);

Inventors:

Troy Ribaudo, Portland, OR (US);

Eric A. Shaner, Rio Rancho, NM (US);

Paul Davids, Albuquerque, NM (US);

David W. Peters, Albuquerque, NM (US);

Assignee:

Sandia Corporation, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/15 (2006.01); G01J 1/00 (2006.01); H01L 49/00 (2006.01); H01L 31/101 (2006.01); H01L 27/16 (2006.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 49/00 (2013.01); H01L 31/101 (2013.01); H01L 27/16 (2013.01); H01L 33/0004 (2013.01);
Abstract

A highly directional thermal emitter device comprises a two-dimensional periodic array of heavily doped semiconductor structures on a surface of a substrate. The array provides a highly directional thermal emission at a peak wavelength between 3 and 15 microns when the array is heated. For example, highly doped silicon (HDSi) with a plasma frequency in the mid-wave infrared was used to fabricate nearly perfect absorbing two-dimensional gratings structures that function as highly directional thermal radiators. The absorption and emission characteristics of the HDSi devices possessed a high degree of angular dependence for infrared absorption in the 10-12 micron range, while maintaining high reflectivity of solar radiation (˜64%) at large incidence angles.


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