The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

May. 17, 2013
Applicant:

Epistar Corporation, Hsinchu, TW;

Inventors:

Cheng Hsiang Ho, Hsinchu, TW;

Biau-Dar Chen, Hsinchu, TW;

Liang Sheng Chi, Hsinchu, TW;

Chun Chang Chen, Hsinchu, TW;

Pei Shan Fang, Hsinchu, TW;

Assignee:

Epistar Corporation, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/15 (2006.01); H01L 29/26 (2006.01); H01L 31/12 (2006.01); H01L 33/00 (2010.01); H01L 33/26 (2010.01); B23K 26/00 (2014.01); H01L 33/20 (2010.01);
U.S. Cl.
CPC ...
H01L 33/26 (2013.01); H01L 33/0095 (2013.01); B23K 26/0039 (2013.01); B23K 26/0057 (2013.01); H01L 33/20 (2013.01); B23K 2201/40 (2013.01);
Abstract

A method of fabricating an optoelectronic device, comprising: providing a substrate, wherein the substrate comprises a first major surface and a second major surface opposite to the first major surface; forming a light emitting stack on the second major surface of the substrate; forming a supporting layer covering the light emitting stack; forming a plurality of first modified regions in the substrate by employing a first energy into the substrate, wherein the supporting layer is formed before forming the plurality of first modified regions; forming an oxide layer on the first major surface of the substrate; and cleaving the substrate along the plurality of first modified regions.


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