The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Feb. 10, 2011
Applicants:
Charles T. Black, New York, NY (US);
Kathryn Wilder Guarini, Yorktown Heights, NY (US);
Inventors:
Charles T. Black, New York, NY (US);
Kathryn Wilder Guarini, Yorktown Heights, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); B82Y 10/00 (2011.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 29/788 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
B82Y 10/00 (2013.01); H01L 21/28273 (2013.01); H01L 21/28282 (2013.01); H01L 29/42332 (2013.01); H01L 29/7887 (2013.01); H01L 29/7923 (2013.01); G11C 2216/06 (2013.01); Y10S 438/947 (2013.01); Y10S 977/78 (2013.01); Y10S 977/783 (2013.01); Y10S 977/883 (2013.01); Y10S 977/888 (2013.01);
Abstract
A method of making a nanoparticle array that includes replicating a dimension of a self-assembled film into a dielectric film, to form a porous dielectric film, conformally depositing a material over the said porous dielectric film, and anisotropically and selectively etching the deposited material.