The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Aug. 18, 2010
Applicants:

Klaus Köhler, Freiburg, DE;

Stefan Müller, Freiburg, DE;

Patrick Waltereit, Freiburg, DE;

Inventors:

Klaus Köhler, Freiburg, DE;

Stefan Müller, Freiburg, DE;

Patrick Waltereit, Freiburg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66462 (2013.01); H01L 29/2003 (2013.01); H01L 29/7787 (2013.01);
Abstract

A method for determining the structure of a transistor having at least one first layer including GaN, one second layer including AlGaN disposed on the first layer, and one fourth layer including a metal or an alloy disposed on the second layer. The method includes setting the layer thickness of the second layer, setting the aluminum content x of the second layer, producing at least the second layer and the first layer, determining the surface potential of formula (I) and/or the charge carrier density n, and/or the charge carrier motility μ after producing the second layer and the first layer, and selecting the material of the fourth layer as a function of the at least one measurement result.


Find Patent Forward Citations

Loading…