The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Jul. 02, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jennifer N. Cha, Union City, CA (US);

James L. Hedrick, Pleasanton, CA (US);

Ho-Cheol Kim, San Jose, CA (US);

Robert D. Miller, San Jose, CA (US);

Willi Volksen, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/30 (2006.01); C08L 53/00 (2006.01); C08L 101/12 (2006.01);
U.S. Cl.
CPC ...
C08L 101/12 (2013.01); C08L 53/00 (2013.01);
Abstract

A structure. The structure includes a substrate and a material adhered to said substrate. The material includes a structural layer and an interfacial layer. The structural layer includes at least one crosslinkable polymer and nanostructures having a predefined morphology. The nanostructures are surrounded by the at least one crosslinkable polymer in the structural layer. The interfacial layer essentially lacks nanostructures and includes essentially the at least one crosslinkable polymer.


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