The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Oct. 13, 2010
Applicants:

Christopher Matranga, Pittsburgh, PA (US);

Robert L. Thompson, Pittsburgh, PA (US);

Congjun Wang, Bethel Park, PA (US);

Inventors:

Christopher Matranga, Pittsburgh, PA (US);

Robert L. Thompson, Pittsburgh, PA (US);

Congjun Wang, Bethel Park, PA (US);

Assignee:

U.S. Department of Energy, Washington, DC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C07C 1/12 (2006.01); C07C 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The method provides for use of sensitized photocatalyst for the photocatalytic reduction of COunder visible light illumination. The photosensitized catalyst is comprised of a wide band gap semiconductor material, a transition metal co-catalyst, and a semiconductor sensitizer. The semiconductor sensitizer is photoexcited by visible light and forms a Type II band alignment with the wide band gap semiconductor material. The wide band gap semiconductor material and the semiconductor sensitizer may be a plurality of particles, and the particle diameters may be selected to accomplish desired band widths and optimize charge injection under visible light illumination by utilizing quantum size effects. In a particular embodiment, COis reduced under visible light illumination using a CdSe/Pt/TiO2 sensitized photocatalyst with HO as a hydrogen source.


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