The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Jun. 03, 2014
Applicant:

Rave, Llc, Delray Beach, FL (US);

Inventors:

Jeffrey E. LeClaire, Boca Raton, FL (US);

Kenneth G. Roessler, Boca Raton, FL (US);

David Brinkley, Baltimore, MD (US);

Assignee:

Rave, LLC, Delray Beach, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); G03F 1/82 (2012.01);
U.S. Cl.
CPC ...
B08B 7/0042 (2013.01); G03F 1/82 (2013.01); Y10S 134/902 (2013.01);
Abstract

Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.


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