The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Apr. 06, 2012
Samir S. Ahmad, San Diego, CA (US);
Leonardo Alberto Baloa Welzien, Lake Forest, CA (US);
Enrico Brambilla, Irvine, CA (US);
Lauren Cheney, San Marcos, CA (US);
Iva Segalman, Irvine, CA (US);
Simon Johnson, Carlsbad, CA (US);
Samir S. Ahmad, San Diego, CA (US);
Leonardo Alberto Baloa Welzien, Lake Forest, CA (US);
Enrico Brambilla, Irvine, CA (US);
Lauren Cheney, San Marcos, CA (US);
Iva Segalman, Irvine, CA (US);
Simon Johnson, Carlsbad, CA (US);
Breathe Technologies, Inc., Irvine, CA (US);
Abstract
Indicating fit status of a mask in communication with a respiratory assistance device is disclosed. Upon initiating a therapeutic gas delivery from the respiratory assistance device to the mask, one or more measurements from respective one or more sensors of the respiratory assistance device is received. A leakage value from these measurements is derived, and a mask fit index is assigned. This is based at least upon a correlation of the leakage value to a particular sub-range of predetermined leakage values that corresponds to the mask fit index. The particular sub-range of predetermined leakage values is one among a plurality of sub-ranges, which together comprises an overall mask fit range defined at least by an ideal mask fit region, a loose mask fit region, and a tight mask fit region. A mask fit status based upon the assigned mask fit index is output to an indicator interface.