The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Nov. 23, 2012
Heinz Fabian, Grossostheim, DE;
Juergen Roeper, Sandersdorf-Brehna, DE;
Heinz Fabian, Grossostheim, DE;
Juergen Roeper, Sandersdorf-Brehna, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: providing a liquid SiOfeedstock material (), which comprises more than 70% by wt. of the octamethylcyclotetrasiloxane D4, vaporizing the SiOfeedstock material () into a gaseous SiOfeedstock vapor (), converting the SiOfeedstock vapor () into SiOparticles, depositing the SiOparticles on a deposition surface () while forming a SiOsoot body (), vitrifying the SiOsoot body () while forming the synthetic quartz glass. According to the invention it is provided that vaporizing the heated SiOfeedstock material () comprises an injection phase in an expansion chamber () in which the heated SiOfeedstock material () is atomized into droplets, the droplets having a mean diameter of less than 5 pm, preferably less than 2 μm.