The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

May. 20, 2010
Applicants:

Fan-tien Cheng, Tainan, TW;

Chi-an Kao, Tainan, TW;

Hsien-cheng Huang, Taoyuan County, TW;

Yung-cheng Chang, Tainan County, TW;

Inventors:

Fan-Tien Cheng, Tainan, TW;

Chi-An Kao, Tainan, TW;

Hsien-Cheng Huang, Taoyuan County, TW;

Yung-Cheng Chang, Tainan County, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G06E 1/00 (2006.01); G06F 3/00 (2006.01); G06F 15/18 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 2219/31459 (2013.01); G05B 2219/32191 (2013.01); G05B 2219/35346 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A manufacturing execution system (MES) with virtual-metrology capabilities and a manufacturing system including the MES are provided. The MES is built on a middleware architecture (such as an object request broker architecture), and includes an equipment manager, a virtual metrology system (VMS), a statistical process control (SPC) system, an alarm manager and a scheduler. The manufacturing system includes a first process tool, a second process tool, a metrology tool, the aforementioned MES, a first R2R (Run-to-Run) controller and a second R2R controller.


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