The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Dec. 08, 2009
Mieko Kuwahara, Kanagawa, JP;
Takuji Yoshida, Kanagawa, JP;
Katsuyuki Akutsu, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A hologram recording film manufacturing method includes the steps of obtaining a laminated structure by alternately laminating M (where M≧2) photosensitive material precursor layers including a photosensitive material and at least one (M−1) resin layer on one another, obtaining M photosensitive material layers, where at least two interference fringes with a desired pitch and a desired slant angle are formed on each of the M photosensitive material layers, from the M photosensitive material precursor layers by irradiating the laminated structure with a reference laser light beam and an object laser light beam, and making the slant angles of the M photosensitive material layers different from each other while retaining the pitch value, which is defined on a face of the photosensitive material layer, by irradiating the laminated structure with an energy ray from the laminated structure's one face side, and heating the laminated structure.